In analog layout design, precise layout matching techniques are crucial to ensure the accuracy and performance of the circuit so that transistors exhibit similar electrical properties (i.e.

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

With small geometry silicon processes, additional nonfunctional geometric structures are required to maintain layer planarity during the chemical/mechanical polishing (CMP) phase of processing. The ...